Large enhancement of photocatalytic activity in ZnO thin films grown by plasma-enhanced atomic layer deposition

Omerzu, Aleš; Peter, Robert; Jardas, Daria; Turel, Iztok; Salamon, Krešimir; Podlogar, Matejka; Vengust, Damjan; Badovinac Jelovica, Ivana; Kavre Piltaver, Ivna (2021) Large enhancement of photocatalytic activity in ZnO thin films grown by plasma-enhanced atomic layer deposition. Surfaces and Interfaces, 23 . ISSN 2468-0230

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Abstract

In this work, we present a large, tenfold enhancement in the photocatalytic activity of thin ZnO films grown by plasma-enhanced atomic layer deposition (PE-ALD) at 100 °C, compared to values obtained for thin ZnO films deposited by a conventional thermal ALD method at the same temperature. Thus, we have demonstrated that we can deposit thin ZnO films using the PE-ALD method both at low temperatures and with a high photocatalytic ability. A number of structural (SEM, EDX, HRTEM, GIXRD, XRR, XPS, SIMS) and optical (UV-Vis, PL) experimental techniques have been employed to elucidate a possible physical origin of the observed remarkable difference in the photocatalytic activity of thin ZnO films grown by the PE-ALD method compared to those grown by the thermal ALD method.

Item Type:	Article
Uncontrolled Keywords:	Zinc oxide ;Thin film ; Atomic layer deposition ; Plasma ; Photocatalysis
Subjects:	NATURAL SCIENCES > Physics > Condensed Matter Physics
Divisions:	Division of Materials Physics
Depositing User:	Krešimir Salamon
Date Deposited:	06 Dec 2022 13:23
URI:	http://fulir.irb.hr/id/eprint/7701
DOI:	10.1016/j.surfin.2021.100984

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