Radiation Hardness of Oxide Thin Films Prepared by Magnetron Sputtering Deposition

Škrabić, Marko; Majer, Marija; Siketić, Zdravko; Mičetić, Maja; Knežević Medija, Željka; Karlušić, Marko (2025) Radiation Hardness of Oxide Thin Films Prepared by Magnetron Sputtering Deposition. Applied Sciences, 15 (13). ISSN 2076-3417

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Abstract

Thin amorphous oxide films (a-SiO2, a-Al2O3, a-MgO) were prepared by magnetron sputtering deposition. Their response to high-energy heavy ion beams (23 MeV I, 18 MeV Cu, 2.5 MeV Cu) and gamma-ray (1.25 MeV) irradiation was studied by elastic recoil detection analysis and infrared spectroscopy. It was established that their high radiation hardness is due to a high level of disorder, already present in as-prepared samples, so the high-energy heavy ion irradiation cannot change their structure much. In the case of a-SiO2, this resulted in a completely different response to high-energy heavy ion irradiation found previously in thermally grown a-SiO2. In the case of a-MgO, only gamma-ray irradiation was found to induce significant changes.

Item Type:	Article
Uncontrolled Keywords:	high-energy heavy ion; ion track; gamma irradiation; IR spectroscopy; ERDA; oxides
Subjects:	NATURAL SCIENCES NATURAL SCIENCES > Physics NATURAL SCIENCES > Physics > Condensed Matter Physics
Divisions:	Division of Experimental Physics Division of Materials Physics
Projects:	Project title Project leader Project code Project type Ozračavanje amorfnih oksidnih materijala s brzim teškim ionima Marko Karlušić IP-2022-10-5023 UNSPECIFIED Potpora vrhunskim istraživanjima Centra izvrsnosti za napredne materijale i senzore- Mile Ivanda; Milko Jakšić; Mario Stipčević; Marko Kralj KK.01.1.1.01.0001 EK
Depositing User:	Marko Karlušić
Date Deposited:	17 Dec 2025 10:53
URI:	http://fulir.irb.hr/id/eprint/10541
DOI:	10.3390/app15137067

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