Pivac, Branko; Dubček, Pavo; Capan, Ivana; Zulim, Ivan; Betti, Tihomir; Zorc, Hrvoje; Bernstorff, Sigrid (2009) Nano Si Superlattices for the Next Generation Solar Cells. Journal of Nanoscience and Nanotechnology, 9 (6). pp. 3853-3857. ISSN 1533-4880
Abstract
We present a study on amorphous SiO/SiO2 superlattice formation on Si substrate held at room temperature and annealed in the temperature range 600– 1100 °C. Grazing-incidence small-angle X-ray scattering (GISAXS) and X-ray reflectivity were used to study such samples. Amorphous SiO/SiO2 superlattices were prepared by high vacuum physical vapor deposition of 4 nm thin films of SiO and SiO2 (10 layers each) from corresponding targets on silicon substrate. Rotation of the Si substrate during evaporation ensured homogeneity of the films over the whole substrate. We observed that the inhomogeneities introduced into the SiO and SiO2 layers during the deposition(evaporation) give rise to small angle scattering at lower annealing temperatures. After an initial SiO layer thickness reduction for 600 °C annealing, these thicknesses remain virtually unchanged up to 1000 °C, where they start to decrease again which leads to particle formation. Nevertheless, this compacting at low temperatures may lead to the seed formation in SiO layers that will facilitate later Si nanoparticles growth.
Item Type: | Article | ||||||||||||||||
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Uncontrolled Keywords: | Si nanostructures; SiO/SiO2 amorfhous superlattice; small angle X-ray scattering; synchrotron radiation; solar cells | ||||||||||||||||
Subjects: | NATURAL SCIENCES > Physics NATURAL SCIENCES > Physics > Condensed Matter Physics |
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Divisions: | Division of Laser and Atomic Research and Development Division of Materials Physics |
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Depositing User: | Hrvoje Zorc | ||||||||||||||||
Date Deposited: | 06 Nov 2015 15:45 | ||||||||||||||||
URI: | http://fulir.irb.hr/id/eprint/1773 | ||||||||||||||||
DOI: | 10.1166/jnn.2009.NS79 |
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