Comparison of two techniques for reliable characterization of thin metal-dielectric films

Amotchkina, Tatiana; Trubetskov, Michael; Tikhonravov, Alexander; Janicki, Vesna; Sancho-Parramon, Jordi; Zorc, Hrvoje (2011) Comparison of two techniques for reliable characterization of thin metal-dielectric films. Applied Optics, 50 (33). pp. 6189-6197. ISSN 0003-6935

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Abstract

In the present study we determine the optical parameters of thin metal–dielectric films using two different characterization techniques based on nonparametric and multiple oscillator models. We consider four series of thin metal–dielectric films produced under various deposition conditions with different optical properties. We compare characterization results obtained by nonparametric and multiple oscillator techniques and demonstrate that the results are consistent. The consistency of the results proves their reliability.

Item Type:

Article

Additional Information:

This paper was published in Applied Optics and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/ao/abstract.cfm?uri=ao-50-33-6189. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

Uncontrolled Keywords:

interference coatings; deposition and fabrication; materials and process characterization; thin films optical properties; metallic; opaque and absorbing coatings

Subjects:

NATURAL SCIENCES > Physics

Divisions:

Division of Laser and Atomic Research and Development

Projects: