Low Temperature Deposition of SiNx Thin Films by the LPCVD Method

Tijanić, Zdenko; Ristić, Davor; Ivanda, Mile; Bogdanović Radović, Ivančica; Marciuš, Marijan; Ristić, Mira; Gamulin, Ozren; Musić, Svetozar; Furić, Krešimir; Chiasera, Alessandro; Ferrari, Maurizio; Righini, Giancarlo Cesare (2012) Low Temperature Deposition of SiNx Thin Films by the LPCVD Method. Croatica Chemica Acta, 85 (1). pp. 97-100. ISSN 0011-1643

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Abstract

Thin silicon rich nitride (SiNx) films were deposited using the LPCVD (Low Pressure Chemical Vapor Deposition) method. Silane diluted in argon and ammonia were used as the reactant gasses, and the low temperature deposition at 570 degrees C was used. The films were deposited on silicon (111) substrates. Films with the different values of the nitrogen content were deposited by varying the ratio of the flows of ammonia and silane in the horizontal tube reactor. The films were characterized in terms on the surface quality (by scanning electron microscopy), in terms of the nitrogen content x by time of flight elastic recoil detection analysis and by Raman and FTIR spectroscopy. The thickness and dielectric constant were measured by ellipsometry. The films were found to have a very smooth, homogeneous surface with nitrogen content that vary from x = 0 to x = I in dependence on the deposition parameters. The intensity of the Si-N stretching peak has shown strong correlation with the film thickness measured by ellipsometry. The films showed a smooth surface layer and the value of dielectric constant easily controllable by the ratio of the flow of the gases in the reactor.

Item Type:	Article
Uncontrolled Keywords:	silicon nitride; thin film; LPCVD method; Raman; FTIR
Subjects:	NATURAL SCIENCES > Chemistry
Divisions:	Division of Experimental Physics Division of Materials Chemistry Division of Materials Physics
Projects:	Project title Project leader Project code Project type Fizika i primjena nanostruktura i volumne tvari [135746] Mile Ivanda 098-0982904-2898 MZOS Sinteza i mikrostruktura metalnih oksida i oksidnih stakala [85111] Mira Ristić 098-0982904-2952 MZOS Procesi interakcije ionskih snopova i nanostrukture [113630] Milko Jakšić 098-1191005-2876 MZOS
Depositing User:	Mile Ivanda
Date Deposited:	14 Oct 2013 14:04
URI:	http://fulir.irb.hr/id/eprint/784
DOI:	10.5562/cca1970

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