hrvatski jezikClear Cookie - decide language by browser settings

DLTS and EPR study of defects in H implanted silicon

Mikšić, Vesna; Pivac, Branko; Rakvin, Boris; Zorc, Hrvoje; Corni, F.; Tonini, R.; Ottaviani, G. (2002) DLTS and EPR study of defects in H implanted silicon. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 186 (1/4). pp. 36-40. ISSN 0168-583X

| Request a personal copy from author

Abstract

Single crystal CZ Si samples were implanted with hydrogen ions to the dose of 2E16 He ions/cm2 at room temperature and subsequently annealed in vacuum in the temperature interval from 100 to 900C. The aim of the experiment was to determine the conditions for bubble formation within the solid film, which may have important technological application. Defects produced in such samples were studied by deep level transient spectroscopy and electron paramagnetic resonance spectroscopy. It is shown that high dose hydrogen implantation produces vacancy-related and silicon selfinterstitial clusters. The latter are thought to be responsible for the formation of the weak displacement field. The annealing at higher temperatures creates multivacancy-related clusters responsible for the strong displacement field formation.

Item Type: Article
Uncontrolled Keywords: amorphous silicon; solar cells; light soaking; defects
Subjects: NATURAL SCIENCES > Physics
NATURAL SCIENCES > Physics > Condensed Matter Physics
Divisions: Division of Laser and Atomic Research and Development
Division of Materials Physics
Depositing User: Hrvoje Zorc
Date Deposited: 07 May 2015 12:29
Last Modified: 07 May 2015 12:29
URI: http://fulir.irb.hr/id/eprint/1783
DOI: 10.1016/S0168-583X(01)00919-3

Actions (login required)

View Item View Item

Downloads

Downloads per month over past year