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Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films

Masetti, Enrico; Bulir, Jiri; Gagliardi, Serena; Janicki, Vesna; Krasilnikova, Anna; Di Santo, G.; Coluzza, C. (2004) Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films. Thin Solid Films, 455 . pp. 468-472. ISSN 0040-6090

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Abstract

The chemical reactions and diffusion processes at the interface of a metal with oxides and nitrides are a critical issue in the production of metal-dielectric optical filters. The optical properties of these filters depend on the quality of the interfaces between the metal layer and the adjacent dielectric layers. The chemical and physical processes occurring at the silver-dielectric interface are studied by means of ellipsometry and XPS analysis and comprise the subject of the present work.

Item Type: Article
Uncontrolled Keywords: Ellipsometry, XPS, silver, interfaces
Subjects: NATURAL SCIENCES > Physics
Divisions: Division of Laser and Atomic Research and Development
Depositing User: Vesna Janicki
Date Deposited: 11 Nov 2014 12:42
Last Modified: 11 Nov 2014 12:42
URI: http://fulir.irb.hr/id/eprint/1592
DOI: 10.1016/j.tsf.2003.11.244

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